Services
Tools for Nanoimprint Lithography
There is a large variety of nanoimprint tools available on the market. Through our partner MESA+ we have access to 1250 m2 fully equipped cleanroom including three major imprint tools that are suitable for thermal, UV based and soft stamp nanoimprint:
Imprio 55 from Molecular Imprints Inc.
- Step and Flash UV based Nanoimprint tool
- Processes: S-FIL™ and S-FIL/R™
- Transparent template for UV curing of the resist
- Substrate size up to 200mm
- Imprint area per step: from 2mm x 2mm to 30mm x 30mm
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EVG 620 NIL
- Whole wafer UV based Nanoimprint tool
- Template size up to 100mm
- Transparent template for UV curing of the resist
- Imprint area up to 100mm
- If substrate is transparent template can be made of non-transparent material e.g. Si or metal
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Obducat NIL 6
- Thermal imprint system
- Substrate / stamp size up to 150mm
- Temperature up to 250ºC
- Pressure up to 60 Bar
- Stack thickness max. 2mm
- Use of foil instead of hard surface
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