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Nanoimprint Lithography

 

Nanoimprint technology is a new lithographic technique for the fabrication of micro- and nanoscale structures for next generation devices. It competes with DUVL and EUVL by combining the advantages of high resolution EBL and easy replication techniques.

 

 

Advantages of Nanoimprint Lithography   • Easy fabrication of 2D und 3D Features in only one step   • Resolution down to sub-10 nm scale, limited only by the template • Perfect CD control and feature height Exact copy of template features • Low cost of ownership   • For UV based Nanoimprint High precision alignment Very uniform residual layer thickness Wide choice of substrates Low pressure (1-2N) and room temperature process

Variety of Imprint Processes:

 

Thermal imprint

• Template replication into thermal imprint materials (Chuo, 1995). Heating and cooling cycles are necessary.

UV based imprint

• Template replication into UV light curable imprint materials
• Pattern replication on wafer scale, where the imprint material is spun on a substrate prior imprinting (Haisma, 1996)
• Pattern replication on die scale, where the imprint material is dispensed field by field prior imprinting "Step and Flash Imprint Lithography (S-FIL™) (Colburn 1999)

Micro contact printing

• Transfer of chemical pattern onto a surface using soft templates that conform to the substrate surface (Whitesides 2001).

Self-assembly imprint

• Transfer of self-assembled pattern from a template to the surface (Kraus 2005).

Reverse Imprint

• Transfer imprint, where on a stamp pre deposited material remains on the substrate after imprinting (Bao 2002).

 

 

Pattern Transfer After Imprint Lithography