References

 

 

 

 

"Nanostructured Polymer Brushes by UV-Assisted Imprint Lithography and Surface-Initiated Polymerization for Biological Functions"

Edmondo M. Benetti, Canet Acikgoz, Xiaofeng Sui, Boris Vratzov, Mark A. Hempenius, Jurriaan Huskens, G. Julius Vancso

Advanced Functional Materials, Vol 21 (11) 2011, pp. 2088-2095

 

"High-quality global hydrogen silsequioxane contact planarization for nanoimprint lithography"

Serkan Buyukkose, Boris Vratzov, Wilfred van der Wiel

Journal of Vacuum Science & Technology B, Vol. 29 (2) 2011, pp. 021602 - 01602-6

 

"Nanoscale patterning by UV nanoimprint lithography using an organometallic resist"

Ačikgöz, C., Vratzov, B., Hempenius, M.A., Reinhoudt, D.N., Vancso, G.J., Huskens, J

ACS Appl. Mater. Interf. 1 2645 – 2650 (2009)

 

"Integration issues in step and repeat UV nanoimprint lithography"

Charpin-Nicolle, C.; Irmscher, M.; Pritschow, M.; Vratzov, B.; van Vossen, H.; Chiaroni, J.; Massin, J.; Gubbini, P.

Emerging Lithographic Technologies XII. Edited by Schellenberg, Frank M. Proceedings of the SPIE, Volume 6921, pp. 69212I-69212I-10 (2008)

 

"Integration Issues in Step and Repeat UV Nanoimprint lithography"
Christelle Charpin-Nicolle, J.Chiaroni, J.Massin, M.Irmscher, B.Vratzov, H. Van Vossen, P.Gubbini
6th International Conference on Nanoimprint and Nanoprint Technology, 2007

 

"Template manufacturing for nanoimprint lithography using existing infrastructure"

M. Irmscher, J. Butschke, F. Letzkus, H. Sailer, A. Schwersenz, G. Hess, M. Renno, H. Schulz, E. Thompson, B. Vratzov

Proc. SPIE 5992, 59922E (2005)

 

"Electrical Characterization of 12 nm EJ-MOSFETs on SOI Substrates"
W. Henschel, T. Wahlbrink, Y. M. Georgiev, M. Lemme, T. Mollenhauer, B. Vratzov, A. Fuchs, H. Kurz, M. Kittler, and F. Schwierz,
Solid-State Electron. 48 (2004), p. 739

 

"Triple-gate metal-oxide-semiconductor field effect transistors fabricated with interference lithography"

MC Lemme, C. Moormann, H. Lerch, M. Moller, B. Vratzov, and H. Kurz

Nanotechnology, vol. 15, no. 4, pp. S208–S210, Apr. 2004

 

"Wafer scale Patterning by Soft UV-Nanoimprint Lithography"

U. Plachetka, M. Bender, A. Fuchs, B. Vratzov, H. Kurz.

Microelectronic Engineering, Vol 73-74 2004, pp. 167-171.

 

"High resolution lithography with PDMS molds"

M. Bender, U. Plachetka, J. Ran, A. Fuchs, B. Vratzov, H. Kurz, T. Glinsner and F. Lindner.

Journal of Vacuum Science & Technology B, Vol. 22 (6) 2004, pp. 3229-3232.

 

"Interferometric in situ alignment for UV-based nanoimprint"

A. Fuchs, B. Vratzov, T. Wahlbrink, Y. Geogiev and H. Kurz.

Journal of Vacuum Science & Technology B, Vol. 22 (6) 2004, pp. 3242-3245.

 

"Interferometric in-situ aligment for UV-based Nanoimprint"

A. Fuchs, B. Vratzov, T. Wahlbrink, Y. Georgiev, H. Kurz.

EIPBN San Diego 2004.

 

"High Resolution lithography with PDMS-molds"

M. Bender, U. Plachetka, J. Ran, A. Fuchs, B. Vratzov, H. Kurz.

EIPBN San Diego 2004.

 

"Large scale UV-based Nanoimprint lithography"

B. Vratzov, A. Fuchs, M. Lemme, W. Henschel, H. Kurz.

Journal of Vacuum Science Technology B, Vol. 21 (6) 2003, pp. 2760-2764.

 

"UV-NIL: Ein hochauflösendes Lithographieverfahren für die Nanotechnologie"

Boris Vratzov.

(ISBN 3-8322-1347-3), Shaker Verlag, Aachen, April 2003.

 

"Large scale homogeneity of UV based Nanoimprint"

A. Fuchs, B. Vratzov, M. Lemme, W. Henschel, H. Kurz.

First International Conference on NNT 2002, San Francisco/USA, December 11-13, 2002.

 

"UV-Nanoimprint Lithography a promising alternative"

H. Kurz, B. Vratzov, A. Fuchs, B. Spangenberg, M. Bender, M. Otto.

International Workshop on NanoImprint Lithography 2002, Lund/Sweden, January 16-17, 2002.

 

"Prospects of cold UV-Nanoimprint Lithography"

B. Vratzov, A. Fuchs, H. Kurz, M. Bender, M. Otto, B. Spangenberg,

7th Mel_ARI/NID Workshop, Barcelona 2001.

 

"Fabrication of Nanostructures using an UV-based imprint technique"

M. Bender, M. Otto, B. Hadam, B. Vratzov. B. Spangenberg, H. Kurz.

Microelectronic Engineering, Vol. 53, pp. 233-236, 2000.