NT&D - Nanotechnology & Devices

Technology

NT&D is a leader in Nanoimprint technology with over 15 year of experience.

Furthermore, we provide you with the whole process technology for fabrication of wide range of devices including:

Electronics
Storage media
MEMS and NEMS
Optics
Optical Devices
Bio Applications
Microfluidics with integrated nano features
Material science

15nm lines imprinted in UV curable resist

Simultaneous Pattern replication of micro- and nano features.

Analogue Imprint: Pattern replication and transfer into silicon of the first page of the Gutenberg's Bible (B. Vratzov, A. Fuchs, INFO PHYS TECH 34, 2001)

Single channel NMOSFET, 100nm channel width (left), multi-channel NMOSFET, 50nm channel width (right)

Through our collaboration with MESA+, one of the largest nanotechnology research institutes, we have access to the NanoLab that includes following facilities:

1250 m2 fully equipped cleanroom with focus on:

microsystems technology
Nanotechnology
CMOS
materials and process engineering

800 m2 laboratory space:

fully equipped central materials analysis laboratory
specialized laboratories for chemical synthesis and analysis
materials research and analysis
device characterization